Most of the books on infrared characterization are for applications in chemistry and no book has been dedicated to infrared characterization for microelectronics. The focus of the book will be on practical applications useful to the production line and to the research and development of microelectronics. The background knowledge and significance of doing a particular type of infrared measurement will be discussed in detail. The principal purpose of the book is to serve as a useful handbook for practising engineers and scientists in the field of microelectronics.Contents:Introduction to Infrared SpectroscopyThe Properties of Infrared Transparent SubstratesThe Measurement of Oxygen and Carbon and Other Impurities in SiliconThe Measurement of Epitaxial Layer ThicknessThe Characterization of Silicon Dioxide and Silicon Nitride Thin FilmsThe Characterization of PSG, BPSG, SOG and Other GlassesThe Characterization of Amorphous Silicon and Related MaterialsMiscellaneous Applications of Infrared Spectroscopy to MicroelectronicsReadership: Materials scientists and engineers.Key Features:Gives a unique insight into the minds of two men who challenged one of the most cherished paradigms of modern scienceHighlights the personal and social contexts of a major scientific controversy as it developed and was finally resolvedShows how an idea that was heresy eventually became accepted by the scientific community